E-mail
|
CAS
|
Contact
E-mail
|
Contact
|
CAS
|
Chinese
Home
ABOUT US
History
Brief Introduction
Organization
Address from the Director
Landscape
Contact Us
News
Event
Academic Activity
RESEARCH
Research Divisions
Research Directions
Research Achievements
Publications List
Patents List
COOPERATION
Overview
Research Collaborations
International Conferences
PLATFORM
Microstructural Characterization Platform of Functional Materials for Informatics
Superconducting Electronics Facility(SELF)
Integrated Research Platform for In-situ Characterization of Electronic Structure
Microsystem Technology Platform
Test Center for Wireless Sensor Network and Communication
Career
Home
>
PUBLICATIONS
PUBLICATIONS
All-water-based electron-beam lithography using silk as a resist
Date：23-08-2017 | 【
Print
】 【
close
】
附件下载：
Copyright © Shanghai Institute of Microsystem and Information Technology
沪ICP备05005483号-1
ADD：865 Changning Road, Shanghai 200050, China TEL：86-21-62511070 FAX：86-21-62513510
